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Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions

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|Process temperature
|Process temperature
|?
|?
|560 <sup>o</sup>C and 620 <sup>o</sup>C
|560 <sup>o</sup>C (amorph) and 620 <sup>o</sup>C (poly)
|-
|-
|Step coverage
|Step coverage
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