Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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* Boron Glass: 85.4° [84.4°] | * Boron Glass: 85.4° [84.4°] | ||
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Coming soon: | Coming soon: | ||
* Si (native oxide): xx° | Fast [standard] | ||
* SiO<sub>2</sub> (110 nm): xx° | * Si (native oxide): xx° [xx°] | ||
* Boron Glass: xx° | * SiO<sub>2</sub> (110 nm): xx° [xx°] | ||
* Boron Glass: xx° [xx°] | |||
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