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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
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* Boron Glass: 94.5°
* Boron Glass: 94.5°
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* Si (native oxide): 77.8°
Coming soon:
* SiO<sub>2</sub> (110 nm): 81.7°
* Si (native oxide): xx°
* Boron Glass: 97.6°
* SiO<sub>2</sub> (110 nm): xx°
* Boron Glass: xx°


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Track 1 (Track 2):
Track 1 [Track 2]:
* Si (native oxide): 74.9° (73.3°)
* Si (native oxide): 74.9° [73.3°]
* SiO<sub>2</sub> (110 nm): 81.8° (73.4°)
* SiO<sub>2</sub> (110 nm): 81.8° [73.4°]
* Boron Glass: 85.4° (84.4°)
* Boron Glass: 85.4° [84.4°]
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