Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
Appearance
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* 150 mm wafers | * 150 mm wafers | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Silicon, glass, and polymer substrates | Silicon, glass, and polymer substrates | ||
Film or pattern of all but Type IV and resist/polymer | Film or pattern of all but Type IV and resist/polymer | ||
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|style="background:WhiteSmoke; color:black | Silicon, glass, and polymer substrates | ||
Film or pattern of all but Type IV and resist/polymer | |||
|style="background:WhiteSmoke; color:black"| | |||
Silicon and glass wafers | Silicon and glass wafers | ||
Film or pattern of all types | Film or pattern of all types | ||
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Silicon and glass wafers | |||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
1 - 25, multiple batches possible | 1 - 25, multiple batches possible | ||
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|style="background:WhiteSmoke; color:black | 1 - 25, multiple batches possible | ||
|style="background:WhiteSmoke; color:black"| | |||
1 - 25 | 1 - 25 | ||
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1 - 25 | |||
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