Specific Process Knowledge/Lithography/Baking: Difference between revisions
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==Small benchtop hotplates== | ==Small benchtop hotplates== | ||
<gallery caption="Small benctop hotplates" widths="100px" heights="100px" perrow="6"> | |||
File:Benchtop A5 1.jpg|Benchtop hotplate located in A-5 | |||
File:Benchtop A5 1.jpg|Benchtop hotplate located in A-5 | |||
File:Benchtop A5 1.jpg|Benchtop hotplate located in A-5 | |||
File:Benchtop A5 1.jpg|Benchtop hotplate located in A-5 | |||
</gallery> | |||
Hotplate: 90-110C is used for baking of 2" - 6" wafers. Do not exceed 120°C. | Hotplate: 90-110C is used for baking of 2" - 6" wafers. Do not exceed 120°C. | ||