Specific Process Knowledge/Lithography/Baking: Difference between revisions
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==Small benchtop hotplates== | ==Small benchtop hotplates== | ||
[[Image:Benchtop A5 1.jpg|300x300px| | [[Image:Benchtop A5 1.jpg|300x300px|frame|r|Benchtop hotplate located in A-5]] | ||
[[Image:Benchtop A5 1.jpg|300x300px| | [[Image:Benchtop A5 1.jpg|300x300px|frame|r|Benchtop hotplate located in A-5]] | ||
[[Image:Benchtop A5 1.jpg|300x300px| | [[Image:Benchtop A5 1.jpg|300x300px|frame|r|Benchtop hotplate located in A-5]] | ||
Hotplate: 90-110C is used for baking of 2" - 6" wafers. Do not exceed 120°C. | Hotplate: 90-110C is used for baking of 2" - 6" wafers. Do not exceed 120°C. | ||