Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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*Process dependent | *Process dependent | ||
*Tested range: ~ | *Tested range: ~40nm/min - ~200nm/min | ||
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*Process dependent | *Process dependent | ||
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,317 edits |
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*Process dependent | *Process dependent | ||
*Tested range: ~ | *Tested range: ~40nm/min - ~200nm/min | ||
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*Process dependent | *Process dependent | ||