Specific Process Knowledge/Lithography/Baking: Difference between revisions
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![[Specific_Process_Knowledge/Lithography/Baking#Hotplate:_90-110C|Hotplate: 90-110C]] | ![[Specific_Process_Knowledge/Lithography/Baking#Hotplate:_90-110C|Hotplate: 90-110C]] | ||
![[Specific_Process_Knowledge/Lithography/Baking#Hotplate 1 (SU8) and Hotplate 2 (SU8)|Hotplate 1 and 2 (SU8)]] | ![[Specific_Process_Knowledge/Lithography/Baking#Hotplate 1 (SU8) and Hotplate 2 (SU8)|Hotplate 1 and 2 (SU8)]] | ||
![[Specific Process Knowledge/Lithography/Baking#small_hotplates|Small benchtop hotplates]] | |||
![[Specific Process Knowledge/Lithography/Baking#gamma_hotplates|Gamma hotplates]] | |||
![[Specific_Process_Knowledge/Lithography/Baking#Oven 90C|Oven 90C]] | ![[Specific_Process_Knowledge/Lithography/Baking#Oven 90C|Oven 90C]] | ||
![[Specific_Process_Knowledge/Lithography/Baking#Oven: 110C - 250C|Oven: 110C - 250C]] | ![[Specific_Process_Knowledge/Lithography/Baking#Oven: 110C - 250C|Oven: 110C - 250C]] | ||
![[Specific Process Knowledge/Lithography/Pretreatment#Oven 250C|Oven 250C]] | ![[Specific Process Knowledge/Lithography/Pretreatment#Oven 250C|Oven 250C]] | ||
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*Soft bake of SU-8 | *Soft bake of SU-8 | ||
*PEB of SU-8 | *PEB of SU-8 | ||
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Coming soon. | |||
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Coming soon. | |||
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Manual convection bake | Manual convection bake | ||
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Manual convection bake | Manual convection bake | ||
*Dehydration | *Dehydration | ||
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Maximum 110°C | Maximum 110°C | ||
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Fixed at 90°C | Fixed at 90°C | ||
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Fixed at 250°C | Fixed at 250°C | ||
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* 150 mm wafer | * 150 mm wafer | ||
* 200 mm wafer | * 200 mm wafer | ||
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* 100 mm wafers | * 100 mm wafers | ||
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* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers | * 150 mm wafers | ||
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Film or pattern of all types except type IV | Film or pattern of all types except type IV | ||
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Silicon, glass, and polymer substrates | Silicon, glass, and polymer substrates | ||
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Silicon, glass, and high Tg polymer substrates | Silicon, glass, and high Tg polymer substrates | ||
Film or pattern of all types except resist | Film or pattern of all types except resist| | ||
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Pb, Te films | Pb, Te films | ||
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|III-V, copper, steel substrates | |III-V, copper, steel substrates | ||
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Resist is not allowed | Resist is not allowed | ||
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