Specific Process Knowledge/Lithography/Baking: Difference between revisions
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Manual convection bake | Manual convection bake | ||
*Dehydration | *Dehydration | ||
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Coming soon. | |||
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Coming soon. | |||
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Fixed at 250°C | Fixed at 250°C | ||
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* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers | * 150 mm wafers | ||
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Film or pattern of all types except resist | Film or pattern of all types except resist | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Restrictions <br> (Not allowed) | !Restrictions <br> (Not allowed) | ||
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Resist is not allowed | Resist is not allowed | ||
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