Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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'''7.''' In the jdf-file, the design coordinates of the P and Q marks should be defined. In the sdf-file the mark-detection should be set to semi-automatic 'S' (see section 7 in this manual and the separate sdf- and jdf-file preparation manual). In the sdf-file, enter the material center offset out put from PAMS. | '''7.''' In the jdf-file, the design coordinates of the P and Q marks should be defined. In the sdf-file the mark-detection should be set to semi-automatic 'S' (see section 7 in this manual and the separate sdf- and jdf-file preparation manual). In the sdf-file, enter the material center offset out put from PAMS. | ||
{| class = "collapsible collapsed" width=100% style = "border-radius: 10px; border: 1px solid #CE002D;" | |||
! width=100% | ========= OUTPUT of DISTBE Final result (2nA ap5) ================== | |||
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<pre> | |||
PAMS Metrology Tool version 2.0.4b2 | |||
JBX-9300FS Wafer 4 inch A <> | |||
Result Recorded 2015-10-29 16:24:01 | |||
local stage (uncorrected) | |||
Window cc ( 0, 0) ( 90000, 55000) | |||
Material cc ( 12, -32) ( 90012, 55032) | |||
Global mark P: | |||
designed (-17500, 0) ( 72500, 55000) | |||
measured (-17487, -5) ( 72513, 55005) ( 72714, 55242) | |||
Global mark Q: | |||
designed ( 17500, 0) (107500, 55000) | |||
measured ( 17553, -60) (107553, 55060) (107775, 55293) | |||
Gain 1.001144 | |||
Rotation 0.089933 degrees | |||
OFFSET( 12, -32) ;(Material center) | |||
OFFSET( 13, -5) ;(P mark) | |||
end<> | |||
</pre> | |||
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