1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.
2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
== Spin Curves ==
== Spin Curves ==
Revision as of 05:49, 14 July 2016
This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip has thus stopped buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead.
Contact lithography@danchip.dtu.dk if you wish to use this resist.
Spin Curves
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on a Si wafer with native oxide. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus represents the homogeinity of the film on the 4" wafers.
ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximatley 3 months old.
Spin Speed [rpm]
Acceleration [1/s2]
Thickness [nm]
St Dev
3000
4000
111.29
0.65
4000
4000
95.17
2.16
5000
4000
87.23
0.81
ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
Spin Speed [rpm]
Acceleration [1/s2]
Thickness [nm]
St Dev
2000
4000
141.03
1.02
3000
4000
115.96
0.98
4000
4000
100.56
0.80
5000
4000
91.01
0.38
6000
4000
84.85
0.37
ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximatley 6 days old.
