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| Line 4: |
Line 4: |
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| Contact lithography@danchip.dtu.dk if you wish to use this resist. | | Contact lithography@danchip.dtu.dk if you wish to use this resist. |
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| == Process Flow ==
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| {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
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| |-style="background:Black; color:White"
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| !Equipment
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| !Process Parameters
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| !Comments
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| !Initials and date
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|Pretreatment
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| |-
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| |-
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| |-style="background:LightGrey; color:black"
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| |4" Si wafers
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| |No Pretreatment
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| |TIGRE, 23-04-2014
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|Spin Coat
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| |-style="background:LightGrey; color:black"
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| |Spin Coater Manual, LabSpin, A-5
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| |ZEP520A 1:1 or ZEP520A 1:2 E-beam resist
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| 60 sec at various spin speed.
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| Acceleration 4000 s-2,
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| softbake 2 min at 180 deg Celcius
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| |Resist poured directly from bottle or by use of disposable pipette<sup>1</sup>
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| |TIGRE, 23-04-2014, 21-05-2014
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|Characterization
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| |-
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| |-style="background:LightGrey; color:black"
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| |Ellipsometer VASE B-1
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| |9 points measured on 100 mm wafer
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| |ZEP program used; measured at 70 deg only
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| |TIGRE, 23-04-2014, 21-05-2014
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|E-beam Exposure
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| |-
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| |-style="background:LightGrey; color:black"
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| |JEOL 9500 E-beam writer, E-1
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| |Dosepattern 14nm - 100nm,
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| dose 120-280 muC/cm2
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| |Virtual chip mark height detection<sup>2</sup>
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| | TIGRE
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|Development
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| |-style="background:LightGrey; color:black"
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| |Fumehood, D-3
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| |60 sec in N50,
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| 60 sec rinse in IPA,
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| N2 Blow dry
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| |Agitation (by hand) while developing
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| | TIGRE, XX-04-2014
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| |-
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| |-style="background:WhiteSmoke; color:black; text-align:center"
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| !colspan="4"|Characterization
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| |-
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| |-style="background:LightGrey; color:black"
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| |Zeiss SEM Supra 60VP, D-3
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| | TIGRE, ??-04-2014
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| |-
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| |}
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| 1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.
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| 2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
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| == Spin Curves == | | == Spin Curves == |
