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| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
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| | This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip will thus stop buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead. |
| |-style="background:silver; color:black"
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| |'''Resist'''
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| |'''Polarity'''
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| |'''Manufacturer'''
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| |'''Comments'''
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| |'''Technical reports'''
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| |'''Spinner'''
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| |'''Developer'''
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| |'''Rinse'''
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| |'''Remover'''
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| |'''Process flows (in docx-format)'''
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| |-style="background:LightGrey; color:black"
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| |'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]'''
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| |Positive
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| |ZEON
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| |Positive resist
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| |[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|ZEP520A spin curves on SSE Spinner]]
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| |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
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| |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]]
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| |IPA
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| |acetone/1165
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| |[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx|Process_Flow_ZEP_with_Al.docx]]
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| |}
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| If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.
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| | Contact lithography@danchip.dtu.dk if you wish to use this resist. |
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| == Process Flow == | | == Process Flow == |
