Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
| Line 173: | Line 173: | ||
==Contrast Curve== | ==Contrast Curve== | ||
The contrast curve is measured on lines 100 nm in width, exposed with doses in the range of 6-80 µC/cm2. After exposure, the sample has been post-exposure baked 5 min @ 110 degree C. Development is performed with mr-DEV 600 in 40s followed by an IPA rinse 60s. | |||
These measurements are performed by WILTID April 2015. | |||
[[File:mrEBL_contrast.png|400px]] | [[File:mrEBL_contrast.png|400px]] | ||