Jump to content

Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions

← Older editNewer edit →
VisualWikitext
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
Line 144: Line 144:
|-
|-
|-style="background:blue; color:White"
|-style="background:blue; color:White"
!colspan="3"|MicroResist mr EBL 6000 spinning on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
!colspan="3"|MicroResist mr EBL 6000. Spin coated on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
|-
|-


Line 199: Line 199:
|}
|}


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 40%"
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 30%"
|-
|-


|-
|-
|-style="background:red; color:White"
|-style="background:red; color:White"
!colspan="7"|MicroResist mr EBL 6000 spinning on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
!colspan="3"|MicroResist mr EBL 6000 diluted 1:1 in anisole. Spin coated on Spin Coater: Manual LabSpin A-5, WILTID, 2015. Softbake 3 min @ 110 degC.
|-
|-


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/mrEBL6000"