Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|15-06-2016, LabSpin E-5, 2000 rpm, 60s, softbaked 60s @ 205 degC | |15-06-2016, LabSpin E-5, 2000 rpm, 60s, softbaked 60s @ 205 degC | ||
|15-06-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | |15-06-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | ||
|16-06-2016, Fumehood E-4, AR-600-546, rinsed in IPA 60s. | |16-06-2016, Fumehood E-4, AR-600-546, 30s/60s/90s, rinsed in IPA 60s. | ||
|JUNE/JULY 2016 SEM Supra 2, 10 keV | |JUNE/JULY 2016 SEM Supra 2, 10 keV | ||
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