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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|CSAR AR-P6200.18 AllResist
|CSAR AR-P6200.18 AllResist
|08-02-2016, LabSpin E-5, 2000 rpm, 60s, softbaked 60s @ 205 degC
|15-06-2016, LabSpin E-5, 2000 rpm, 60s, softbaked 60s @ 205 degC
|09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces
|15-06-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces
|11-02-2016, Fumehood E-4, AR-600-546, rinsed in IPA 60s.
|16-06-2016, Fumehood E-4, AR-600-546, rinsed in IPA 60s.
|02-03-2016 SEM Supra 2, 10 keV
|JUNE/JULY 2016 SEM Supra 2, 10 keV
|-
|-


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