Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|CSAR AR-P6200 AllResist, CSAR AR-P6200 diluted 1:1 in Anisole | |CSAR AR-P6200.09 AllResist, CSAR AR-P6200.09 diluted 1:1 in Anisole | ||
|08-02-2016, LabSpin E-5, 4000 rpm, 60s, softbaked 60s @ 205 degC | |08-02-2016, LabSpin E-5, 4000 rpm, 60s, softbaked 60s @ 205 degC | ||
|09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | |09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | ||