Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1: Difference between revisions
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Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..." |
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| ICP Metal Etch / jmli | | ICP Metal Etch / jmli | ||
| 2*30 sec barc etch using 'slow etch with carrier' | | 2*30 sec barc etch using 'slow etch with carrier' | ||
| isoslow1 , 2:00 minutes | | danchip/jmlli/Si/isotropice/isoslow1 , 2:00 minutes | ||
| S005292 | | S005292 | ||
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