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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic: Difference between revisions

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Created page with "= Isotropic etching in silicon on the ICP Metal Etch = {| border="1" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process parameters''' |- ! rowspan="2"..."
 
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! rowspan="2" width="20"| Time
! rowspan="2" width="20"| Time
! rowspan="2" width="20"| Pres.
! rowspan="2" width="20"| Pres.
! rowspan="2" width="20"| [[Main Page/Process Logs/jmli/Parameters#Hardware | Hardware]]  
! rowspan="2" width="20"| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | Hardware]]
! colspan="10" | Gasses
! colspan="10" | Gasses
! colspan="2" | RF powers
! colspan="2" | RF powers
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