Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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=== Dark Erosion === | === Dark Erosion === | ||
Dark erosion is measured on a un-exposed 4" wafer spin coated with CSAR 6200.18. | Dark erosion is measured on a un-exposed 4" wafer spin coated with CSAR 6200.18. The resist thickness has been measured by VASE Ellipsometer before development, and after 3 minutes, 13 minutes, and 30 minutes of development in AR 600 546. | ||
[[File:dark erosion.png|right| | The graphs shows teh measured thicknesses; the errorbars represents the standard deviations from the ellipsometric measurements. | ||
[[File:dark erosion.png|right|400px]] | |||
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== Dosetests == | == Dosetests == | ||