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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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Please be aware that I have experienced a somewhat large thickness deviation (5-8 %) depending on the amount of resist applied to the wafer before spin coating.
Please be aware that I have experienced a somewhat large thickness deviation (5-8 %) depending on the amount of resist applied to the wafer before spin coating.
<span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span>




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