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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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<span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span>
<span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span>


[[File:SpinCurveCSAR.jpg|right|600px]]
 
[[File:CSAR_09.png|400px]]
[[File:CSAR_09.png|right|400px]]
[[File:CSAR_18.png|400px]]
[[File:CSAR_18.png|right|400px]]




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|-
|-
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="7"|AllResist AR-P 6200 (> 2ml per 4" wafer) spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC.
!colspan="7"|AllResist AR-P 6200.09 (> 2ml per 4" wafer) spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 09-04-2014. Softbake 5 min @ 150 degC.
|-
|-


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!Acceleration [1/s2]
!Acceleration [1/s2]
!Thickness [nm]
!Thickness [nm]
!St Dev
|-
|-


Line 179: Line 178:
|2000
|2000
|4000
|4000
|225.98
|226
|0.97
|-
|-


Line 187: Line 185:
|3000
|3000
|4000
|4000
|194.00
|194
|0.6
|-
|-


Line 195: Line 192:
|4000
|4000
|4000
|4000
|169.57
|170
|0.32
|-
|-


Line 203: Line 199:
|5000
|5000
|4000
|4000
|151.47
|151
|0.26
|-
|-


Line 211: Line 206:
|6000
|6000
|4000
|4000
|142.38
|142
|0.41
|-
|-


Line 219: Line 213:
|7000
|7000
|4000
|4000
|126.59
|127
|0.36
|-
|-


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|-
|-
|-style="background:green; color:White"
|-style="background:red; color:White"
!colspan="7"|AllResist CSAR (< 2ml per 4" wafer) on Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
!colspan="7"|AllResist CSAR 1:1 in anisole (< 2ml per 4" wafer), Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
|-
|-


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!Acceleration [1/s2]
!Acceleration [1/s2]
!Thickness [nm]
!Thickness [nm]
!St Dev
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|2000
|4000
|84
|-
|-


Line 247: Line 246:
|3000
|3000
|4000
|4000
|201.61
|67
|1.20
|-
|-


Line 255: Line 253:
|4000
|4000
|4000
|4000
|173.89
|59
|0.64
|-
 
|-
|-style="background:Silver; color:black"
|5000
|4000
|53
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|5000
|6000
|4000
|4000
|155.91
|49
|0.65
|-
|-


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|-
|-
|-style="background:red; color:White"
|-style="background:red; color:White"
!colspan="7"|AllResist CSAR 1:1 in anisole (< 2ml per 4" wafer), Spin Coater: Manual LabSpin A-5, TIGRE, 16-06-2014. Softbake 2 min @ 150 degC.
!colspan="7"|AllResist CSAR:18 (< 2ml per 4" wafer), Spin Coater: Manual Standard Resists, E-5, TIGRE, 15-06-2016. Softbake 2 min @ 180 degC.
|-
|-


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!Acceleration [1/s2]
!Acceleration [1/s2]
!Thickness [nm]
!Thickness [nm]
!St Dev
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|2000
|2000
|4000
|2000
|83.48
|1003
|0.49
|-
|-


Line 298: Line 299:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|3000
|3000
|4000
|2000
|67.12
|809
|0.41
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|4000
|4000
|4000
|2000
|58.64
|721
|0.44
|-
|-


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|-style="background:Silver; color:black"
|-style="background:Silver; color:black"
|5000
|5000
|4000
|2000
|53.13
|639
|0.39
|-
|-


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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|6000
|6000
|4000
|2000
|48.76
|586
|0.38
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|7000
|2000
|549
|-
|-


|}
|}
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