Specific Process Knowledge/Etch/DRIE-Pegasus/ProcessA/PrA-1: Difference between revisions
Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="2" width="120"| Substrate Informa..." |
No edit summary |
||
| Line 50: | Line 50: | ||
| C03991.05 | | C03991.05 | ||
| | | | ||
[[file:C03991.05 144.jpg|150px|frameless ]] | |||
[[file:C03991.05 145.jpg|150px|frameless ]] | |||
[[file:C03991.05 146.jpg|150px|frameless ]] | |||
[[file:C03991.05 147.jpg|150px|frameless ]] | |||
[[file:C03991.05 148.jpg|150px|frameless ]] | |||
[[file:C03991.05 149.jpg|150px|frameless ]] | |||
[[file:C03991.05 150.jpg|150px|frameless ]] | |||
[[file:C03991.05 151.jpg|150px|frameless ]] | |||
[[file:C03991.05 137.jpg|150px|frameless ]] | |||
[[file:C03991.05 138.jpg|150px|frameless ]] | |||
[[file:C03991.05 139.jpg|150px|frameless ]] | |||
[[file:C03991.05 140.jpg|150px|frameless ]] | |||
[[file:C03991.05 141.jpg|150px|frameless ]] | |||
[[file:C03991.05 142.jpg|150px|frameless ]] | |||
[[file:C03991.05 143.jpg|150px|frameless ]] | |||
|- | |- | ||
Revision as of 14:32, 15 June 2016
| Date | Substrate Information | Process Information | SEM Images | |||
|---|---|---|---|---|---|---|
| Wafer info | Exposed area | Conditioning | Recipe | Wafer ID | ||
| 2/5-2016 | 4" Travka20 Wafer | 20 % Si | 3 minute TDESC clean | PrA-1, 80 cycles or 14:40 minutes | C03991.02 |
|
| 2/5-2016 | 4" Travka20 Wafer | 20 % Si | 3 minute TDESC clean | PrA-1, 80 cycles or 14:40 minutes | C03991.05 |
|
| 3/6-2016 | 4" Travka20 Wafer | 20 % Si | 3 minute TDESC clean | PrA-1, 80 cycles or 14:40 minutes | C04047.02 | |
| 3/6-2016 | 4" Travka20 Wafer | 20 % Si | 3 minute TDESC clean | PrA-1, 80 cycles or 14:40 minutes | C04047.05 | |
