Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/mediumiso1: Difference between revisions
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| jml/isotropic/mediumiso1 2:00 minutes | | jml/isotropic/mediumiso1 2:00 minutes | ||
| S003961 | | S003961 | ||
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[[file:S003961-01.jpg |120px|frameless ]] | [[file:S003961-01.jpg |120px|frameless ]] | ||
Revision as of 09:02, 8 June 2016
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 9/4-2014 | 4" | travka05 wafer 1.5 µm AZ | Si / 5 % | Pegasus/jmli | 5 minute TDESC clean + MU runs | jml/isotropic/mediumiso1 2:00 minutes | S003961 |
| |
| 6/6-2016 | 6" | travka35 wafer 1.5 µm AZ | Si / 35 % | Pegasus/jmli | standard/danchip/mediumiso1 2:00 minutes | S006534 |
| ||
| 6/6-2016 | 6" | travka35 wafer 1.5 µm AZ | Si / 35 % | Pegasus/jmli | standard/danchip/mediumiso1 4:00 minutes | S006535 |
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