Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic: Difference between revisions

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! width="50"| Coil  
! width="50"| Coil  
! width="50"| Platen
! width="50"| Platen
! colspan="2" | Process observations
! width="50"| Runs
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! Runs
! width="100" | Key words
! width="100" | Key words
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Revision as of 12:51, 3 June 2016

Mediumiso
Recipe Step Temp. Deposition step Etch step Process observations
Time Pres. C4F8 SF6 O2 Coil Time Pres. C4F8 SF6 O2 Coil Platen HW Runs Key words
mediumiso1 - 20 NA NA NA NA NA NA NA 25 0 150 0 600 3 - 1 NA
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Mediumiso
Recipe Step Temperature Time Pressure C4F8 SF6 O2 Ar Coil Platen Runs Key words
mediumiso1 - 20 NA 25 0 150 0 600 3 1 NA