Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch: Difference between revisions
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== Etch processes designed for stepper resists == | |||
The stepper produces features down to 200 nm. Here, etch processes especially designed for stepper patterns and resists are described. We intend to develop them continuously so keep an eye on this page. The best ones so far are: | |||
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