Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 18:47, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature grown multilayers on flat surfaces ← Older edit		Revision as of 18:48, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature grown multilayers on flat surfaces Newer edit →
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	<gallery caption="" widths="~~1500px~~" heights="~~1500px~~" perrow="2">		<gallery caption="" widths="1000px" heights="1000px" perrow="1">
	image:Al2O3_TiO2_flat_multilayers.jpg\| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.		image:Al2O3_TiO2_flat_multilayers.jpg\| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches.