Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 18:06, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of Al2O3 ← Older edit		Revision as of 18:09, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature deposition of Al2O3 Newer edit →
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	Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)		Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)

	This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature.		This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results can be found here:[http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK]