Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | image:Al2O3_LT_RI.JPG| Measured refractive index distribution across 100 mm wafer. | ||
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b> | |||
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==Low temperature deposition of TiO<sub>2</sub>== | ==Low temperature deposition of TiO<sub>2</sub>== | ||