Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. | |||
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|bgcolor="#98FB98" |'''Al<sub>2</sub>O<sub>3</sub> deposition at 120 <sup>o</sup>C''' | |||
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{| {{table}} | |||
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{| border="2" cellspacing="2" cellpadding="3" align="center" style="width:750px" | |||
! colspan="5" |Deposition conditions at 120 <sup>o</sup>C for Al2O3 LT recipe | |||
|- | |||
!Number of cycles | |||
|<b>Thickness (nm)</b> | |||
|<b>Uniformity across 100mm Si substrate (%)</b> | |||
|<b>Standard deviation error</b> | |||
|<b>Refractive index @ 632.8 nm</b> | |||
|- | |||
|250 | |||
|10.17 | |||
|2.19 | |||
|0.14 | |||
|2.18 | |||
|- | |||
|500 | |||
|23.12 | |||
|1.80 | |||
|0.23 | |||
|2.40 | |||
|- | |||
|750 | |||
|34.13 | |||
|1.87 | |||
|0.39 | |||
|2.39 | |||
|- | |||
|1000 | |||
|46.13 | |||
|1.78 | |||
|0.50 | |||
|2.39 | |||
|- | |||
|} | |||
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%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%% | |||
Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C) | Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C) | ||