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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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<b>Recipe: Al2O3 LT</b>
<b>Recipe: Al2O3 LT</b>


<b>Temperature:80-150 <sup>o</sup>C</b>
<b>Temperature: 80-150 <sup>o</sup>C</b>


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