Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

Revision as of 15:19, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Low temperature grown multilayers on flat surfaces ← Older edit		Revision as of 15:19, 19 May 2016 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Al2O3/TiO2 multilayers on high aspect ratio structures Newer edit →
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	Recipe: Multi T		Recipe: Multi T

	Temperature: ~~150C~~		Temperature: 150 <sup>o</sup>C