Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
| Line 23: | Line 23: | ||
Recipe: EMA04 | Recipe: EMA04 | ||
Temperature: | Temperature: 120 <sup>o</sup>C | ||
==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ||