Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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Recipe: Al2O3LT | Recipe: Al2O3LT | ||
Temperature:80- | Temperature:80-150 <sup>o</sup>C | ||
==Low temperature deposition of TiO<sub>2</sub>== | ==Low temperature deposition of TiO<sub>2</sub>== | ||
Revision as of 15:18, 19 May 2016
This page describes non standart recipes including multilayers structures.
Low temperature deposition of Al2O3
Recipe: Al2O3LT
Temperature:80-150 oC
Low temperature deposition of TiO2
Recipe: TiO2LT
Temperature: 80-150C
Low temperature grown multilayers on flat surfaces
Recipe: EMA01
Recipe: EMA02
Recipe: EMA03
Recipe: EMA04
Temperature: 120C
Al2O3/TiO2 multilayers on high aspect ratio structures
Recipe: Multi T
Temperature: 150C