Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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Temperature: 120C
Temperature: 120C


==Al2O3/TiO2 multilayers on high aspect ratio structures==
==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures==


Recipe: Multi T
Recipe: Multi T


Temperature: 150C
Temperature: 150C

Revision as of 14:18, 19 May 2016

This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al2O3

Recipe: Al2O3LT

Temperature:80-150C

Low temperature deposition of TiO2

Recipe: TiO2LT

Temperature: 80-150C

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120C

Al2O3/TiO2 multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 150C

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