Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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Recipe: EMA01
Recipe: EMA01
Recipe: EMA02
Recipe: EMA02
Recipe: EMA03
Recipe: EMA03
Recipe: EMA04
Recipe: EMA04
Temperature: 120C
==Al2O3/TiO2 multilayers on high aspect ratio structures==
Recipe: Multi T


Temperature: 120C
Temperature: 120C

Revision as of 15:11, 19 May 2016

This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al2O3

Recipe: Al2O3LT

Temperature:80-150C

Low temperature deposition of TiO2

Recipe: TiO2LT

Temperature: 80-150C

Flat Low temperature grown multilayers

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120C

Al2O3/TiO2 multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 120C

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