Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf| chart]] demonstrating a dependence between 250nm line width/pillors diameter and exposure dose. | Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf| chart]] demonstrating a dependence between 250nm line width/pillors diameter and exposure dose. | ||
===Standard processes=== | |||
*'''(1000) DCH PEB 130C 60s''' 60s baking at 130°C | *'''(1000) DCH PEB 130C 60s''' 60s baking at 130°C | ||
*'''(1001) DCH PEB 130C 90s''' 90s baking at 130°C | *'''(1001) DCH PEB 130C 90s''' 90s baking at 130°C | ||