Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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*Negative DUV resist for spinning in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range [[Media:UVN2300.pdf|UVN2300-0.8]]. | *Negative DUV resist for spinning in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range [[Media:UVN2300.pdf|UVN2300-0.8]]. | ||
'''Standard processes | '''Standard processes''' | ||
BARC | BARC DUV42S-6: | ||
*'''(1001) DCH 150mm BARC 65nm''' Dispense 3ml@1000rpm; spin-off 60s@4700rpm; softbake 60s@175°C | *'''(1001) DCH 150mm BARC 65nm''' Dispense 3ml@1000rpm; spin-off 60s@4700rpm; softbake 60s@175°C | ||
*'''(1002) DCH 100mm BARC 65nm''' Dispense 1.6ml@1000rpm; spin-off 60s@4700rpm; softbake 60s@175°C | *'''(1002) DCH 100mm BARC 65nm''' Dispense 1.6ml@1000rpm; spin-off 60s@4700rpm; softbake 60s@175°C | ||
KRF M230Y | KRF M230Y: | ||
*'''(1011) DCH 150mm M230Y 360nm''' Dispense 3.9ml@1000rpm; spin-off 60s@2500rpm; softbake 90s@130°C | *'''(1011) DCH 150mm M230Y 360nm''' Dispense 3.9ml@1000rpm; spin-off 60s@2500rpm; softbake 90s@130°C | ||
*'''(1012) DCH 100mm M230Y 360nm''' Dispense 1ml@1000rpm; spin-off 60s@2500rpm; softbake 90s@130°C | *'''(1012) DCH 100mm M230Y 360nm''' Dispense 1ml@1000rpm; spin-off 60s@2500rpm; softbake 90s@130°C | ||
KRF M35G | KRF M35G: | ||
*'''(1021) DCH 150mm M35G 750nm''' | *'''(1021) DCH 150mm M35G 750nm''' | ||
*'''(1022) DCH 100mm M35G 750nm''' | *'''(1022) DCH 100mm M35G 750nm''' | ||