Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
| Line 78: | Line 78: | ||
<br/> | <br/> | ||
==SiO2 etch using DUV mask | ==SiO2 etch using DUV mask== | ||
Two chemistry regimes has been explored: One using CF4 and one using C4F8 | Two chemistry regimes has been explored: One using CF4 and one using C4F8 | ||