Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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== Process information == | == Process information == | ||
*[[Optimization and Simulation|Optimization and Simulation]] | *[[Optimization and Simulation|Optimization and Simulation]] | ||
*[[Reticle Design|Reticle Design]] | |||
*A DUV reticle is needed that should be designed by the customer. Please note that the projection magnification of the stepper is 1:5, so that the dimensions of the pattern on the reticle are expanded by a factor 5 with respect to those printed on the wafer. | *A DUV reticle is needed that should be designed by the customer. Please note that the projection magnification of the stepper is 1:5, so that the dimensions of the pattern on the reticle are expanded by a factor 5 with respect to those printed on the wafer. | ||