Specific Process Knowledge/Characterization/SEM Supra 1

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The SEM Supra 1 located in basement 346-907

SEM Supra 1

The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.

The SEM is the training SEM at DTU Danchip. It means that all new SEM users with no or little SEM experience must be trained on this tool and gain basic knowledge here before being qualified for training on other SEM's.

The SEM Supra 1 was installed in the cleanroom in November 2010, but it has now been relocated in the basement outside the cleanroom, so that users can avoid to clean samples that have been outside the cleanroom before SEM inspection.

The Balzer Sputter is located in the same room as the SEM Supra 1 and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection to avoid charging problems.

Only users with samples that are somehow related to the cleanroom can use this SEM. Other users will have to contact DTU CEN.

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 1 info page in LabManager,

Performance information

• SEM comparison page

Equipment performance

Equipment		SEM Supra 1 (Supra 40VP SEM)
Purpose	Imaging and measurement of	Any sample except bulk insulators such as polymers, glass or quartz wafers
Location		Basement of DTU Danchip
Performance	Resolution	1-2 nm (limited by vibrations) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (Se2) Inlens secondary electron (Inlens) 4 Quadrant Backscatter electron (QBSD) Variable pressure secondary electron (VPSE)
	Stage	X, Y: 130 × 130 mm T: -4 to 70o R: 360o Z: 50 mm
	Electron source	FEG (Field Emission Gun) source
	Operating pressures	Fixed at High vacuum (2 × 10-4mbar - 10-6mbar) Variable at Low vacuum (0.1 mbar - 2 mbar)
	Options	All software options available
Substrates	Batch size	Up to 6" wafer with full view
	Allowed materials	Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool