Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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== Scanning electron microscopy at Danchip==
== Scanning electron microscopy at Danchip==


At Danchip there a four SEMs (scanning electron microscopes) that all cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.  
At Danchip there are four SEMs (scanning electron microscopes) that all cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.  


At the turn of the year 2015-2016 we made a reorganisation of the SEM's at Danchip. The old workhorse SEM's (the LEO and Supra 1) that have excellently served the users of the cleanroom for many years will be given new roles:
At the turn of the year 2015-2016 we made a reorganisation of the SEM's at Danchip. The old workhorse SEM's (the LEO and Supra 1) that have excellently served the users of the cleanroom for many years will be given new roles:


* The Leo SEM is a very reliable and rugged instrument that provides high quality images of most samples. It is exclusively dedicated to the users of the Raith E-beam lithography system so general imaging of user samples is no longer allowed.  
* The Leo SEM is a very reliable and rugged instrument that provides high quality images of most samples. It is exclusively dedicated to the users of the Raith E-beam lithography system so general imaging of user samples is no longer allowed.  
* The SEM Supra 1 (formerly known as SEM Zeiss) has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.
* The SEM Supra 1 has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.


The two remaining SEM's at Danchip (called SEM Supra 2 and SEM Supra 3) serve as general imaging tools in the cleanroom. Like Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The SEM Supra 2 is also equipped with an airlock and an EDX detector.
The two remaining SEM's at Danchip (called SEM Supra 2 and SEM Supra 3) serve as general imaging tools in the cleanroom. Like Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The SEM Supra 2 is also equipped with an airlock and an EDX detector.

Revision as of 10:06, 4 May 2016

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Scanning electron microscopy at Danchip

At Danchip there are four SEMs (scanning electron microscopes) that all cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.

At the turn of the year 2015-2016 we made a reorganisation of the SEM's at Danchip. The old workhorse SEM's (the LEO and Supra 1) that have excellently served the users of the cleanroom for many years will be given new roles:

  • The Leo SEM is a very reliable and rugged instrument that provides high quality images of most samples. It is exclusively dedicated to the users of the Raith E-beam lithography system so general imaging of user samples is no longer allowed.
  • The SEM Supra 1 has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.

The two remaining SEM's at Danchip (called SEM Supra 2 and SEM Supra 3) serve as general imaging tools in the cleanroom. Like Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The SEM Supra 2 is also equipped with an airlock and an EDX detector.

All four SEMs all manufactured by Carl Zeiss and have the same graphical user interface and very identical electron optics. But there are there are small hardware and software differences, thus a training is needed for each SEM you want to use.

Three SEMs are located in the cleanroom (SEM Supra 2, SEM Supra 3 and SEM LEO), and one SEM is located in the basement (SEM Supra 1).

Scanning electron microscopy at CEN

Please add some generals text about SEM at CEN.



Common challenges in scanning electron microscopy


Comparison of SEM's at Danchip

Equipment SEM LEO SEM Supra 1 SEM Supra 2 SEM Supra 3
Purpose Imaging and measurement of
  • Any (semi)conducting sample that may have thin (~ 5 µm <) layers of non-conducting materials on top
  • Any sample except bulk insulators such as polymers, glass or quartz wafers
  • Any sample except bulk insulators such as polymers, glass or quartz wafers
  • Any sample except bulk insulators such as polymers, glass or quartz wafers
Other purpose
  • E-beam lithography using Raith Elphy Quantum system
  • Surface material analysis using EDX
Instrument Position
  • Cleanroom of DTU Danchip
  • Basement of DTU Danchip
  • Cleanroom of DTU Danchip
  • Cleanroom of DTU Danchip
Performance Resolution The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples
  • ~ 5 nm (limited by vibrations)
  • 1-2 nm (limited by vibrations)
  • 1-2 nm (limited by vibrations)
  • 1-2 nm (limited by vibrations)
Instrument specifics Detectors
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • Backscatter electron (BSD)
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • 4 Quadrant Backscatter electron (QBSD)
  • Variable pressure secondary electron (VPSE)
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • 4 Quadrant Backscatter electron (QBSD)
  • Variable pressure secondary electron (VPSE)
  • Secondary electron (Se2)
  • Inlens secondary electron (Inlens)
  • High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
  • Variable pressure secondary electron (VPSE)
Stage
  • X, Y: 125 × 100 mm
  • T: 0 to 90o
  • R: 360o
  • Z: 48 mm
  • X, Y: 130 × 130 mm
  • T: -4 to 70o
  • R: 360o
  • Z: 50 mm
  • X, Y: 150 × 150 mm
  • T: -10 to 70o
  • R: 360o
  • Z: 50 mm
  • X, Y: 130 × 130 mm
  • T: -4 to 70o
  • R: 360o
  • Z: 50 mm
Electron source FEG (Field Emission Gun) source
Operating pressures
  • Fixed at High vacuum (2 × 10-5mbar - 10-6mbar)
  • Fixed at High vacuum (2 × 10-4mbar - 10-6mbar)
  • Variable at Low vacuum (0.1 mbar-2 mbar)
  • Fixed at High vacuum (2 × 10-4mbar - 10-6mbar)
  • Variable at Low vacuum (0.1 mbar-2 mbar)
  • Fixed at High vacuum (2 × 10-4mbar - 10-6mbar)
  • Variable at Low vacuum (0.1 mbar-2 mbar)
Options
  • Raith Elphy Quantum E-Beam Litography system
  • All software options available
  • Antivibration platform
  • Fjeld M-200 airlock taking up to 8" wafers
  • Oxford Instruments X-MaxN 50 mm2 SDD EDX detector and AZtec software package
  • High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
Substrates Sample sizes
  • Wafers up to 6" (only full view up to 4")
  • Up to 6" wafer with full view
  • Up to 8" wafer with 6" view
  • Up to 6" wafer with full view
Allowed materials
  • Any standard cleanroom materials
  • Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool
  • Any standard cleanroom materials
  • Any standard cleanroom materials


Comparison of the SEM's at CEN

SEM Inspect S SEM FEI Nova 600 NanoSEM SEM FEI Quanta 200 ESEM FEG FIB-SEM FEI QUANTA 200 3D Dual Beam FEI Helios Nanolab 600
Purpose A B C D E
Equipment position CEN A CEN B CEN C CEN D CEN E
Instrument resolution A B C D E
Detectors A B C D E
Stage specifications A B C D E
Options A B C D E
Max sample size A B C D E


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