Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so system so general imaging of user samples is no longer allowed. | However, the SEM LEO has now been equipped with a Raith e-beam lithography system, and from the turn of the year 2015-2016 it is exclusively dedicated to the users of the Raith E-beam lithography, so system so general imaging of user samples is no longer allowed. | ||
The SEM LEO | The SEM LEO is located in the cleanroom. It was installed in 1998, and the software was ungraded in 2012. | ||