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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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||374nm||505nm||578nm||336nm||235nm
||374nm||505nm||578nm||336nm||235nm
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|'''Etch rate'''||37.4nm/min||50.5nm/min||231nm/min|134.4nm/min||88nm/min
|'''Etch rate'''||37.4nm/min||50.5nm/min||231nm/min||134.4nm/min||88nm/min


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