Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
Appearance
No edit summary |
|||
| Line 3: | Line 3: | ||
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | ||
=With CF4 and H2 chemistry= | |||
==Part 1== | |||
<!-- | <!-- | ||
/* Font Definitions */ | /* Font Definitions */ | ||
| Line 650: | Line 651: | ||
</div> | </div> | ||
==Part 2== | |||
<div class=WordSection1> | <div class=WordSection1> | ||