Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Difference between revisions
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| width=128 valign=top style='width:96.0pt;border-top:none;border-left: none;border-bottom:solid white 1.0pt;border-right:solid white 1.0pt; background:#D0D8E8;padding:3.6pt 7.2pt 3.6pt 7.2pt;height:52.5pt' | <p class=MsoNormal>Low pressure gives better profile, less polymer, however, | | width=128 valign=top style='width:96.0pt;border-top:none;border-left: none;border-bottom:solid white 1.0pt;border-right:solid white 1.0pt; background:#D0D8E8;padding:3.6pt 7.2pt 3.6pt 7.2pt;height:52.5pt' | <p class=MsoNormal>Low pressure gives better profile, less polymer, however, | ||
CF4 etch Si too quick</p> | CF4 etch Si too quick</p> | ||
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| width=136 style='width:102.0pt;border:solid white 1.0pt;border-top:none; background:#D0D8E8;padding:2.25pt 2.25pt 2.25pt 2.25pt;height:52.5pt' | | | width=136 style='width:102.0pt;border:solid white 1.0pt;border-top:none; background:#D0D8E8;padding:2.25pt 2.25pt 2.25pt 2.25pt;height:52.5pt' | | ||