Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
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==SiO2 etch using DUV mask [[Image:section under construction.jpg|70px]]== | ==SiO2 etch using DUV mask [[Image:section under construction.jpg|70px]]== | ||
[[File:s008462_00.jpg|400px]][[File:s008462_05.jpg|400px]] | [[File:s008462_00.jpg|400px]][[File:s008462_05.jpg|400px]] | ||
Two chemistry regimes has been explored: One using CF4 and one using C4F8 | |||
CF4: | |||
C4F8: | |||
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