Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
| Line 222: | Line 222: | ||
<gallery widths="200px" heights="150px" perrow="3"> | <gallery widths="200px" heights="150px" perrow="3"> | ||
image:250uc_lable_T0d_534.jpg|Top view of resist after etch | image:250uc_lable_T0d_534.jpg|Top view of resist after etch | ||
image:320uc_line400nm_cent_T0d_524.jpg|large sidewal roughness | image:320uc_line400nm_cent_T0d_524.jpg|400nm lines - large sidewal roughness | ||
image:px1283mk_T30deg_506.jpg|Tilt 30 deg. | image:px1283mk_T30deg_506.jpg|Tilt 30 deg. | ||
</gallery> | </gallery> | ||