Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
| Line 219: | Line 219: | ||
|- | |- | ||
|SEM images | |SEM images | ||
| | | | ||
<gallery widths="200px" heights="150px" perrow="3"> | |||
image:250uc_lable_T0d_534.jpg|250µC lable | |||
image:320uc_line400nm_cent_T0d_524.jpg|320µC line 400nm | |||
image:px1283mk_T30deg_506.jpg|Tilt 30 deg. | |||
</gallery> | |||
|- | |- | ||
|} | |} | ||