Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
Appearance
| Line 140: | Line 140: | ||
|- | |- | ||
|} | |} | ||
<br clear="all"/> | |||
==SiO2 etch with e-beam resist [[Image:section under construction.jpg|70px]]== | ==SiO2 etch with e-beam resist [[Image:section under construction.jpg|70px]]== | ||